AIXTRON Black Magic PECVD System
- Low temperature, multiwall, singlewall and supergrowth nanotubes via thermal growth or PECVD
- Graphene growth
- High heater ramp rates and closed loop substrate temperature control via an infrared temperature sensor
- High temperature annealing up to 1000°C in Hydrogen / Argon / Nitrogen, maximum ramp rate of up to 300°C/min
- Ultra-high purity gas delivery system to ensure high quality films with repeatable results
- Substrates up to 6"
- Restrictions on substrate materials