AIXTRON Black Magic PECVD System


  • Low temperature, multiwall, singlewall and supergrowth nanotubes via thermal growth or PECVD
  • Graphene growth
  • High heater ramp rates and closed loop substrate temperature control via an infrared temperature sensor
  • High temperature annealing up to 1000°C in Hydrogen / Argon / Nitrogen, maximum ramp rate of up to 300°C/min
  • Ultra-high purity gas delivery system to ensure high quality films with repeatable results
  • Substrates up to 6"
  • Restrictions on substrate materials