CEE 200CBX Coat-Bake System

  • Windows based touch-screen interface
  • Can hold up to 250,000 programs
  • 0.1 second resolution for step times with a range of 0 - 9,999.9 sec/step

Spin Coater:

  • Up to 12,000 rpm and 30,000 rpm/s (varies by substrate size)
  • Up to 100 steps per program
  • Chucks available for 3 & 4" wafers and partials <1cm (bowl can accommodate wafers up to 8" and squares up to 7 X 7")
  • Spin speed repeatability and resolution: within < 0.2 rpm
  • Manual dispense
  • Resists available: AZ 1512, AZ 1518, AZ P4620, SU-8 2010, and SU-8 3025

Bake Plate:

  • Rampable program control with up to 1000 steps
  • Temperature range: ambient to 300°C
  • Temperature resolution: ± 0.1°C
  • Temperature uniformity: 0.3% across working surface

Facility