Photomask Service

Mask and Mold Service will no longer be offered through the NCF
​​​​​​​The Heidelberg DWL 200 is still available for direct writing



Working off of your design files, we can fabricate 3", 4", or 5" low-reflective chrome photomasks on soda lime or quartz plates for use in contact or stepper lithography.  

  • Competitive with commercially available writing services
  • Less than 48 hr turn-around time
  • Mask delivered clean and sealed with a protective case
  • Rapid prototyping

Stocked Materials (custom materials available upon request):

  • 3", 4" & 5" X .090” Soda Lime 
  • 5" X .090” Quartz for 5X GCA 


  • Accepted file formats: gdsii (preferred format), dxf, gerber, and cif
  • Features down to 1 µm
  • CD guaranteed down to 2 µm with a tolerance of ± 0.25 µm
  • Defect spec: 0 >5 µm



    Direct write lithography tool used as a high resolution pattern generator for photomask fabrication and patterning of substrates.