Additional NCF Equipment

The NCF offers a number of additional capabilities in materials synthesis and device fabrication.


Highly flexible thermal or plasma enhanced CVD system capable of carbon nanotube, nanofiber, and graphene deposition.

Advanced thin and thick film step height measurement tool.

A solid-source electron cyclotron resonance (ECR) plasma deposition system that forms high-quality thin films. Films of various oxides and nitrides can be formed, as well as multi-layer films.  

This tool was generously donated to UCSB by the JSW AFTY Corporation of Japan.

Vacuum sealer for transport of sensitive samples.

Programmable bench-top box furnace.

OPV fabrication and testing system.

Ultrapure Diamond CVD.

Wet benches available for solvent, developer, and acid/base processing.