Photomask and Mold Services

Photomasks

Working off of your design files, we can fabricate 3", 4", or 5" low-reflective chrome photomasks on soda lime or quartz plates for use in contact or stepper lithography.  

  • Competitive with commercially available writing services
  • 24 - 48 hr turn time
  • Mask delivered clean with a protective case
  • Rapid prototyping

Stocked Materials (custom materials available upon request):

  • 3", 4" & 5" X .090” Soda Lime 
  • 5" X .090” Quartz for 5X GCA 

​Specifications:

  • Accepted file formats: gdsii, dxf, gerber, and cif
  • Features down to 1 µm
  • CD guaranteed down to 2 µm with a tolerance of ± 0.25 µm
  • Defect spec: 0 >5 µm

 

Microfluidic Molds

Working off of your design files we will create a photomask that will be used to fabricate microfluidic molds on 100 mm silicon wafers.

  • 10 - 100 µm SU-8
  • Discounted photomask for CDs >10µm
  • Multi-layer capabiility
  • Etched silicon molds with metal layers available upon request
  • Hydrophobic surface treatment (FDTS) available upon request

Equipment

Direct write lithography tool used as a high resolution pattern generator for photomask fabrication and patterning of substrates.