CEE 200CBX Coat-Bake System

Description

• Windows based touch-screen interface
• Can hold up to 250,000 programs
• 0.1 second resolution for step times with a range of 0 - 9,999.9 sec/step

Spin Coater:

• Up to 12,000 rpm and 30,000 rpm/s (varies by substrate size)
• Up to 100 steps per program
• Chucks available for 3 & 4" wafers and partials <1cm (bowl can accommodate wafers up to 8" and squares up to 7 X 7")
• Spin speed repeatability and resolution: within < 0.2 rpm
• Manual dispense
• Resists available: AZ 1512, AZ 1518, AZ P4620, SU-8 2010, and SU-8 3025

Bake Plate:

• Rampable program control with up to 1000 steps
• Temperature range: ambient to 300°C
• Temperature resolution: ± 0.1°C
• Temperature uniformity: 0.3% across working surface