Quantum Structures Facility (QSF)

Formerly known as the CNSI Nanostructures Cleanroom Facility (NCF), the Quantum Structures Facility (QSF) features cleanroom-based tool sets and processes that complement research in quantum materials and devices enabling unique capabilities in the pursuit of controlling and manipulating materials at the nanoscale.

The facility houses a mix of traditional semi-conductor processing equipment, specialty deposition tools, a photoluminescent/Raman spectroscopy suite that includes a cryostat for cryogenic spectroscopy, and a Crystal Growth Facility that houses various types of crystal growth furnaces. An electro-optical characterization set up and probe station to test devices that is also available to UCSB users though a partnership with Hewlett Packard Enterprises (HPE).

Besides providing access to process and characterization equipment, the QSF is now one of the locations for the new NSF-funded Quantum Foundry with the addition of diamond specific etch, irradiation, and growth tools, as well as three dilution refrigeration units.

Protein patterning.
A multipurpose bulk crystal growth facility supporting both oxide and intermetallic crystal growth in a variety of growth environments.
Characterization of optoelectronic devices.
Tools for the deposition, etch, and irradiation of diamond thin films.
Lithography, thin-film deposition, and wet etch.

 How-to Information

Steps to Access the Quantum Structures Facility
  1. Contact QSF staff to get trained on the instrument.
  2. Apply to CNSI for electronic door access to the facility.
  3. QSF Staff will add you to the FBS reservation system
Acknowledging Support

Please remember to acknowledge CNSI resources in scientific publications and presentations by including this statement:

“The authors acknowledge the use of the Quantum Structures Facility within the California NanoSystems Institute, supported by the University of California, Santa Barbara and the University of California, Office of the President.”

For work related to the Quantum Foundry also include:

"This work is supported by the National Science Foundation through Enabling Quantum Leap: Convergent Accelerated Discovery Foundries for Quantum Materials Science, Engineering and Information (Q-AMASE-i) award number DMR-1906325."

 Contact

Specialist
Lab Manager
Quantum Structures Facility and Confocal Microscope and Spectroscopy Facility

 Recharge Rates

 Equipment

Advanced thin and thick film step height measurement tool.
Precision coat-bake system combines a track-quality precision spin coater with a high-uniformity bake plate.
Floating zone technique produces large, high purity single crystals.
Single zone furnace with vertical and rotational motion control.
Direct write lithography tool used as a high resolution pattern generator for photomask fabrication and patterning of substrates.
A solid-source electron cyclotron resonance (ECR) plasma deposition system that forms high-quality thin films. Films of various oxides and nitrides can be formed, as well as multi-layer films.
Centralized computer system that is capable of controlling and monitoring up to twelve temperature zones independently.
A vertical Bridgman furnace with two independently controlled heating zones.
A top-loading furnace with two independently controlled zones.
Three zone tube furnaces, each capable of independent operation.
Vacuum sealer for transport of sensitive samples.
Workhorse box furnace equipped with a wide operating temperature range of 50°C to 1100°C with 1°C resolution.
Nikon Optical Microscope
Reactive ion etcher (RIE) is dedicated for diamond-only etching to create nanostructures and photonic/phononic devices in diamond.
PCT electron beam system for the bulk irradiation of diamond samples to create vacancies and enhance nitrogen-vacancy center formation.
Large format direct writing tool specifically designed to create in vitro micro-environments.
Ultrapure Diamond CVD with available Nitrogen doping.
Microwave plasma chemical vapor deposition (CVD) for growth of high-quality homoepitaxial diamond thin films.
Contact aligner for broadband lithography. Backside alignment capability.
Wet benches available for solvent, developer, and acid/base processing.
Oxygen plasma cleaning system with downstream and direct plasma cleaning capabilities.