Nanofabrication Cluster

Lithography

A Class 100 yellow room for contact lithography and direct writing of photomasks and microfluidic molds. Tools include a Heidelberg direct-write laser lithography system, a Suss MicroTec MA/BA6 contact aligner, and support equipment for resist spin, bake, develop, ash, and inspection.

ECR Deposition

A solid-source electron cyclotron resonance (ECR) plasma deposition system that forms high-quality thin films. Films of various oxides and nitrides can be formed, as well as multi-layer films.

This tool was generously donated to UCSB by the JSW AFTY Corporation of Japan.

Wet Etch

Wet benches are available for solvent, acid, and base usage, including HF or perchloric acid cleaning.

 How-to Information

Steps to Access the Quantum Structures Facility
  1. Contact QSF staff to get trained on the instrument.
  2. Apply to CNSI for electronic door access to the facility.
  3. QSF Staff will add you to the FBS reservation system
Acknowledging Support

Please remember to acknowledge CNSI resources in scientific publications and presentations by including this statement:

“The authors acknowledge the use of the Quantum Structures Facility within the California NanoSystems Institute, supported by the University of California, Santa Barbara and the University of California, Office of the President.”

For work related to the Quantum Foundry also include:

"This work is supported by the National Science Foundation through Enabling Quantum Leap: Convergent Accelerated Discovery Foundries for Quantum Materials Science, Engineering and Information (Q-AMASE-i) award number DMR-1906325."

 Contact

Specialist
Lab Manager
Quantum Structures Facility and Confocal Microscope and Spectroscopy Facility

 Recharge Rates

 Equipment

Advanced thin and thick film step height measurement tool.
Precision coat-bake system combines a track-quality precision spin coater with a high-uniformity bake plate.
Direct write lithography tool used as a high resolution pattern generator for photomask fabrication and patterning of substrates.
Nikon Optical Microscope
Contact aligner for broadband lithography. Backside alignment capability.
Wet benches available for solvent, developer, and acid/base processing.
Oxygen plasma cleaning system with downstream and direct plasma cleaning capabilities.
A solid-source electron cyclotron resonance (ECR) plasma deposition system that forms high-quality thin films. Films of various oxides and nitrides can be formed, as well as multi-layer films.
Vacuum sealer for transport of sensitive samples.
Workhorse box furnace equipped with a wide operating temperature range of 50°C to 1100°C with 1°C resolution.