Wet Processing

Solvent Bench #1:

• Designated for lift-off and general use
• Small bench-top ultrasonic bath
• Nitrogen guns
• Approved Chemicals: Acetone, isopropanol, toluene, NMP, and dimethyl sulfoxide
• ​Located in photolithography bay (yellow light)

Solvent Bench #2:

• Designated for resist stripping and general use
• Heated recirculating NMP bath with ultrasonic, can accommodate wafers up to 6"
• Hotplate stirrer
• Nitrogen guns
• Approved Chemicals: Acetone, isopropanol, toluene, NMP, and dimethyl sulfoxide
• ​​Located in photolithography bay (yellow light)

Developer Bench:

• Designated for photoresist developing and rinsing of solvent soaked (isopropanol only) substrates.
• Single sink with goose neck faucet
• Nitrogen and DI water guns
• Approved Chemicals: AZ 400K developer, AZ 726 MIF developer and AZ developer
• ​Located in photolithography bay (yellow light)

Acid/Base Bench #1:

• Designated for perchloric acid cleaning process only
• Restricted use

Acid/Base Bench #2:

• Designated for general use; etching, cleaning, etc.
• Double sinks with goose neck faucets
• Nitrogen and DI water guns
• Hotplate
• Approved Chemicals: Sulfuric acid, nitric acid, hydrochloric acid, acetic acid, Nano-Strip, chromium etchant 1020, aluminum etchant Type A, hydrogen peroxide, and sodium hydroxide

Acid/HF Bench #3:

• Designated for RCA cleaning process, organics removal, and hydrofluoric acid use.
• Single sink with goose neck faucet
• Nitrogen and DI water guns
• 2 heated baths for Nano-Strip and H₂O:HCl:H₂O₂ (5:1:1)
• 2 ambient baths for clean and dirty HF
• Cascading DI rinse bath with nitrogen bubbler
• All baths can handle wafers up to 8"
• Programmable spin dryer with multi size chuck that can handle 4, 6 & 8" wafers (non vacuum chuck type)